MICROMINIATURE VACUUM TUBE

摘要

A microminiature vacuum tube and a process for fabrication thereof. The tube is formed on a compound semiconductor substrate using solid state semiconductor fabrication techniques. A straight line path for electron flow is provided by forming an emitter and collector in the same plane. The emitter and collector are formed in a low resistance layer of a compound semiconductor substrate, such as by etching a recess through the low resistance layer and into the substrate to define a separate emitter and collector. Preferential etching techniques are utilized to form a sharp-edge in at least the emitter portion of the recess. A gate is formed in the recess proximate to but out of the plane for electron flow. The use of microminiature solid state fabrication technique allows the recess to be formed at submicron size to reduce the voltage requirements on the microminiature vacuum tube.