| 摘要 |
PURPOSE:To easily and efficiently obtain a patterned light shielding layer at high accuracy by applying a specified ink compsn., curing, and then removing a photosensitive resin layer and a silicone rubber layer by the same means as used for a developing process. CONSTITUTION:A photosensitive resin layer which becomes soluble in an area exposed to light and a silicone rubber layer are laminated in this order on the surface of a light-transmitting base body. This laminated body is exposed and developed by photolithography to remove the exposed area of the silicone rubber layer and the photosensitive resin layer under the silicone rubber layer to form a pattern. Then an ink compsn. containing a black coloring material which is cured with light or heat is applied on the pattern part and subjected to posttreatment. Then the photosensitive resin layer 5 remaining on the substrate where the layer is not exposed in the pattern exposing process is exposed over the whole surface to become soluble. Then the remaining photosensitive layer is removed with the upper silicon rubber layer. In this case, the silicone rubber layer has to have repelling effect against the ink compsn. used for coloring. |
