| 摘要 |
PURPOSE:To improve sensitivity, resolution, heat resistance, adhesion property, etc., by incorporating an alkali-soluble novolak resin, quinonediazide compd., and specified compd., and specifying the GPC pattern area of the novolak resin. CONSTITUTION:The resist compsn. contains an alkali-soluble novolak resin, quinonediazide compd., and compd. expressed by formula I. GPC graph of the alkali-soluble novolak resin shows that the pattern area for <=1000mol.wt. calculated as polystyrene is <=25% to the total pattern area excluding for unreacted phenols. In formula I, Y1-Y10 are independently hydrogen atom, hydroxy group or alkyl groups, however, at least one of these is hydroxyl group, X is expressed by formula II, and in formula II, R1-R3 are independently hydrogen atom or alkyl group. |
