METHOD OF MAKING FUSED SILICA

摘要

This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: (1) a Si-R bond dissociation energy that is no higher than the dissociation energy of the Si-O bond; (2) a boiling point no higher than 350 DEG C; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.