WINDOW FOR TAKING OUT RADIATION FOR LITHOGRAPHY

摘要

PURPOSE:To obtain a large-sized window for taking out radiation for lithography which has a high transmitting property for the synchrotron radiation. CONSTITUTION:A window for taking out radiation for lithography has a silicon nitride film 1 provided on the upstream side of a beam line and a polyimide film 2 provided on the downstream side of the beam line, and a state of vacuum is maintained between the two films. The window can be made large in size without attenuating the intensity of the radiation. Since the window is stable for oxidation and produces no harmful substance, it can be handled safely.