| 摘要 |
PURPOSE:To perform the conversion treatment of a piece of pattern data and the computation of an exposure quantity at high speed by a method wherein a piece of data for an electron-beam lithographic operation is converted into a piece of bit map data. CONSTITUTION:A CPU 5 performs an operation treatment in order to form a piece of bit map data. A memory 6 stores the routine of the conversion treatment of the piece of bit map data; it stores a piece of actual data during the operation treatment for the conversion of the piece of data or the like. The CPU 5 reads out the routine of the conversion treatment by using an instruction memory in the memory 6; accordingly, it progresses the conversion treatment while a piece of data inside a data memory is being read out or various pieces of data are being written in the data memory. Thereby, it is not required to compute a piece of geometric data in the conversion of the piece of data. |
