Substrate holder for liq. and gas phase epitaxy - comprises holding place for substrate and contg. intermediate plate

摘要

Substrate holder (10) for liq. phase and gas phase epitaxy comprises at least one holding plate (11.1, 11.2) for a couple of substrates (12.1, 12.2). Each holding place has at least one groove (13.1, 13.2) with a circular periphery to hold both substrate. The novelty is that: (i) an intermediate plate (14.1, 14.2) is present in each holding place and is made of a suitable material; and (ii) the width of each groove is somewhat larger than the total thickness of both substrates and the intermediate plate. Also claimed are: (a) plate made of a material suitable as substrate holder material; and (b) process to hold substrates. In the process to hold substrates, at least a pair of substrates is arranged in a holder, so that its axis fall at right angles to each other. Between both substrates of each pair, an intermediate plate is inserted. ADVANTAGE - The epitaxy layer is not damaged on removal of the coating.