发明名称 |
Diamond layer CVD appts. - has closed gas circuit contg. carbon reactor for process gas regeneration |
摘要 |
A diamond (CVD) appts consists of a CVD reator (1), which is connected at its gas outlet to a pump (2) by a line (3) and at its gas inlet to a carbon reactor (8) by a line (9) contg. a flow regulator (13), and a line (4) which leads from the pump (2) to the carbon reactor (#8), the lines (23, 4, 9) forming a closed gas circuit with the CVD reactor (1), pump (2) and carbon reactor (8). Also claimed is a diamond layer prodn. process employing the above appts., in which reaction gases, leaving the CVD reactor (1), are pumped to a carbon reactor (8) held at 800-1300 deg. C and regenerated reaction gases, leaving the carbon reactor (8), are returned via the flow regulator (13) to the CVD reactor (1). ADVANTAGE - A suitable hydrocarbon-contg. process gas mixt. is continuously available, acetylene and other pyrolysis products (eg aromatic hydrocarbons and carbon black) are removed from the gas stream and hydrogen consumption is reduced
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申请公布号 |
DE4217328(C1) |
申请公布日期 |
1993.09.02 |
申请号 |
DE19924217328 |
申请日期 |
1992.05.26 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG EV, 80636 MUENCHEN, DE |
发明人 |
KLAGES, CLAUS-PETER, DR., 2000 HAMBURG, DE;FRYDA, MATTHIAS, DIPL.-CHEM., 2210 ITZEHOE, DE |
分类号 |
C23C16/27;C23C16/455 |
主分类号 |
C23C16/27 |
代理机构 |
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