发明名称 COMPACT HIGH DENSITY INTERCONNECT STRUCTURE
摘要 An improved high density interconnect structure (10) may include electronic components mounted on both sides of its substrate (12) or a substrate which is only as thick as the semiconductor chips (26) which reduces the overall structure thickness to the thickness of the semiconductor chips plus the combined thickness of the high density interconnect structure's (40) dielectric (42) and conductive (44) layers. In the two-sided structures, feedthroughs (18), which are preferably hermetic, provide connections between opposite sides of the substrate. Substrates of either of these types may be stacked to form a three-dimensional structure. Means for connecting between adjacent substrates are preferably incorporated within the boundaries of the stack rather than on the outside surface thereof. <IMAGE>
申请公布号 US5241456(A) 申请公布日期 1993.08.31
申请号 US19900548462 申请日期 1990.07.02
申请人 GENERAL ELECTRIC COMPANY 发明人 MARCINKIEWICZ, WALTER M.;EICHELBERGER, CHARLES W.;WOJNAROWSKI, ROBERT J.
分类号 H01L23/52;H01L23/538;H01L25/00 主分类号 H01L23/52
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