| 摘要 |
PURPOSE:To increase the alignment accuracy of a shot of a large nonlinear error without decreasing a thropghput too much. CONSTITUTION:All the shots are measured for the forefront wafer of one lot (step 104) and conversion parameters are determined from the measurement results of the plurality of shots which are preliminarily selected (step 105). Then, a specific shot which has a big difference between the arrangement coordinate calculated based on the parameters and the measured coordinate position is stored (step 106). For the wafer for which the specific shot is stored and the wafers after that wafer, an alignment is conducted for the specific shot, for example, based on an individual measurement result. |
