| 摘要 |
PURPOSE: To prevent contamination due to the deposition of a material and with possible free particles of the material by introducing an auxiliary gas in a reactor chamber, so that the gas pressure at an open coupling is equal approximately to the pressure in a process space for staying the process gas. CONSTITUTION: An auxiliary gas 11 is fed into a reactor chamber, so as to realize equal gas pressure at an open coupling 9 to the gas pressure in a process space 8, wherein a process gas 5 is approximately stationary to form a so-called staying layer and can be actually used completely for a layer 6 with comparatively little consumption of the gas, thus comparatively lowering the cost for purifying the process gas itself and exhaust gas. |
