发明名称 METHOD FOR REMOVAL OF MULTILAYER INTERCONNECTION STRUCTURE BODY AND STRUCTURE BODY
摘要 PURPOSE: To enable simultaneous manufacture of a multi-layered thin-film interconnection structure and a ceramic substrate with a good yield by forming on a transmitting substrate a separation layer which is less formed, when reacted with a predetermined electromagnetic radiation. CONSTITUTION: A polymer layer 2 is cut off by applying an ultraviolet light 10 from a scanning layer, via a transmitting substrate 1 to the polymer layer 2. Since a metallic layer 3 acts as a reflecting layer, the ultraviolet light 10 cannot reach an interconnection structure 4. As a result of the laser cut-off, monomer pieces, that is, an emitted substance gas is trapped between the substrate 1 and reflecting metal layer 3, thus forming voids 15 within the polymer layer 2. The polymer layer 2 is formed less due to the voids 15, and thus can be separated (removed) from the substrate 1. After the structure 4 has been removed from the substrate 1, the structure 4 is supported by a metal ring (frame) 5. At this time point, the structure can be applied to an electrically good glass ceramic substrate.
申请公布号 JPH05211249(A) 申请公布日期 1993.08.20
申请号 JP19920110705 申请日期 1992.04.03
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 GUNANARINGAMU AAJIYABARINGAMU;ARINA DOICHIE;FUADO ERIASU DOANII;BURUUSU KENESU FUAAMAN;DONARUDO JIYON HANTO;CHIYANDORASEKAA NARAYAN;MODESUTO MAIKERU OPURISUKO;SANPASU PURUSHIYOSAMAN;BINSENTO RANIERI;SUTEFUAN RENITSUKU;JIEEN MAAGARETSUTO SHIYOO;JIYANUSU SUTANISUROU UIRUKUJINSUKII;DEBITSUTO FURANKU UITSUTOMAN
分类号 B23K26/00;B32B37/00;H01L21/68;H01L23/12;H01L23/15;H05K3/00;H05K3/46 主分类号 B23K26/00
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