发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To enhance acid resistance and adhesiveness to a substrate by incorporating an alkali-soluble resin, a 1,2-quinonediazido compound, and a compound specified in structure. CONSTITUTION:This composition contains the alkali-soluble resin, the 1,2- quinonediazido compound, and the compound represented by formula in which R is, independently, alkyl, preferably, 1-3C alkyl, optionally straight or branched; X is 1,2-, 2,3-, or 3,4-epoxycyclohexyl group optionally substituted by Y: Y is, independently, alkyl or alkoxy, straight or branched, preferably, having 1-3C; and n is an integer of 1-5, preferably, 1-3.
申请公布号 JPH05204158(A) 申请公布日期 1993.08.13
申请号 JP19920036986 申请日期 1992.01.29
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 MIYAMOTO HIDETOSHI;MIYASHITA SATOSHI;ISAMOTO YOSHITSUGU;MIURA TAKAO
分类号 G03F7/085;G03F7/022;G03F7/075;H01L21/027 主分类号 G03F7/085
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