发明名称 |
POSITIVE-TYPE RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE RECORDING MATERIAL MANUFACTURED BY USING SAID MIXTURE |
摘要 |
PURPOSE: To obtain the radiation sensitive mixture high in sensitivity and resolution and free from no corrosive action by using as a base a specified acid- producing compound in combination with a compound cross-linkable by an acid. CONSTITUTION: This radiation sensitive mixture comprises (a) the compound to be allowed to release a strong acid by action of chemical rays, (b) a compound having a C-O-C or C-O-Si bond cleavable by the acid, and (c) a polymer binder insoluble in water but soluble or swellable in an aqueous solution of alkali and the compound (a) is 1-sulfonyloxy-2-pyridone represented by the formula in which R<1> is an H atom or an alkyl group or the like; R<2> is an H or halogen atom or an alkyl group or the like; R<3> is an H atom or an alkyl group; R<4> is an H to halogen atom or a nitro or alkyl group or the like; R<5> is an H atom or an alkyl or aryl group; R<6> is an H or halogen atom or a nitro or alkoxyalkyl group or the like; R<6> is an H or halogen atom or a nitro or alkoxyalkyl group or the like; R<7> is an alkyl or cycloalkyl group or the like; (n) is an integer of 0-30; and (m) is 1 or 2. |
申请公布号 |
JPH05204159(A) |
申请公布日期 |
1993.08.13 |
申请号 |
JP19920124084 |
申请日期 |
1992.04.17 |
申请人 |
HOECHST AG |
发明人 |
GERUHARUTO ROOHAUSU;WARUTAA SHIYUPIISU;GEORUKU PAUROSUKII |
分类号 |
G03F7/00;G03F7/004;G03F7/028;G03F7/039;H01L21/027 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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