| 摘要 |
PURPOSE:To provide the positive type resist composition superior in various performance, such as heat resistance, sensitivity, resolution, and focal depth, and free from scum. CONSTITUTION:This composition comprises an alkali-soluble resin including a novolak resin, obtained by condensing phenols and carbonyl compounds, containing a fraction not over 900 molecular weight in terms of a polystyrene measured by GPC in an amount <=20% of the total pattern area except the nonreacted phenols, a quinonediazido compound, and a phenol compound represented by formula in which each of R1 and R2 is, independently, II or alkyl or the like; each of x and y is, independently, 1, 2, or 3; and m is an integer of 0-4. This phenol compound is used in a phenol to alkali-soluble resin weight ratio of 3:10-5:10. |
