| 摘要 |
PURPOSE: To obtain an aperture plate for a roof-shooter type TIJ (thermal ink jet) printhead by forming a trough in a first face of a silicon wafer by two step orientation dependent etching and a plurality of apertures in a second face. CONSTITUTION: A silicon wafer 10 has a height Hp of 50μm. The upper face 21 of the wafer 10 is masked with masking material, and a trough 20 is formed in the wafer 10 by an anisotropic etching. The face 22 opposite to the trough 20 of the wafer 10 is masked with a pattern of the apertures 30. These apertures 30 play the role of nozzles for the TIJ printhead, when the wafer 10 is bonded with a heater board. An anisotropic etching is conducted on the masked wafer to form a plurality of apertures with the edge inclined because of ODE.
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