THIN FILM DEPOSITING APPARATUS

摘要

1. A device for deposition of films with the method of reactive ionic sublimation, consisting of a vacuum container, equipped with an inlet of working gas, outlet to the vacuum circuit and a crucible shaped as a nozzle, filled with material subject to vaporisation, characterised in that the crucible (7) is located inside the magnetic circuit (4) and connected to a negative end of high-voltage feeder (hv).<IMAGE>