| 摘要 |
<p>PURPOSE:To provide the array substrate for a liquid crystal display device with which address wirings and electrodes are made to have lower resistances, and good TFT characteristics of high reliability are obtainable and which is capable to realize the formation of the liquid crystal display device having a larger-sized screen with higher fineness is possible. CONSTITUTION:This array substrate for the liquid crystal display device is constituted of the address wirings and electrodes 2 formed on an insulating substrate 1, data wirings and electrodes 3 disposed to intersect therewith, transparent picture element electrodes 5 and thin-film transistors(TFTs) 4. Further, the address wirings and electrodes are consisted of multilayered structures of thin films of different metals. The 1st metallic layer on the surface side projects in the horizontal direction of the substrate from the 2nd and subsequent metallic layers and the insulating films coating the address wirings and electrodes 2 are constituted of >=2 layers of laminated films. The insulating film on the side adjacent to the address wirings and electrodes is a silicon oxide film formed by a CVD method or plasma CVD method using TEOS as a main raw material.</p> |
