发明名称 |
Wafer table and exposure apparatus with the same |
摘要 |
A wafer table includes a wafer holding surface for holding a wafer by attraction; a flow passageway through which a temperature adjusting medium flows to remove any heat in the wafer table; a temperature measuring system for measuring the temperature of the wafer held by the wafer holding surface; a temperature adjusting system disposed between the wafer holding surface and the flow passageway; a temperature setting system for setting a temperature related to the wafer held by the wafer holding surface; a flow rate controlling system for controlling the flow rate of the temperature adjusting medium to be circulated through the flow passageway; and a temperature controlling system for controlling the operation of the temperature adjusting system related to heat, on the basis of a value set by the temperature setting system and a value measured by the temperature measuring system.
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申请公布号 |
US5231291(A) |
申请公布日期 |
1993.07.27 |
申请号 |
US19920821888 |
申请日期 |
1992.01.17 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
AMEMIYA, MITSUAKI;SAKAMOTO, EIJI;UDA, KOJI;OZAWA, KUNITAKA;IWAMOTO, KAZUNORI;UZAWA, SHUNICHI;MARUMO, MITSUJI |
分类号 |
G03F7/20;H01L21/00;H01L21/687 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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