MICROWAVE ENERGIZED DEPOSITION PROCESS WHEREIN THE DEPOSITION IS CARRIED OUT AT A PRESSURE LESS THAN THE PRESSURE OF THE MINIMUM POINT ON THE DEPOSITION SYSTEM'S PASCHEN CURVE

摘要

The glow discharge deposition of thin film materials is most advantageously carried out at a pressure which is less than the pressure of the minimum point on the deposition system's Paschen curve and at a power which is in excess of the minimum power required to sustain a deposition plasma at the particular process pressure.