发明名称 |
System for measuring the curvature of a semiconductor wafer |
摘要 |
A system for measuring the curvature of a surface includes a laser for emitting a beam of light to be incident upon the surface; a photodetector for detecting light reflected by the surface; a first stage for selectively moving the surface in a direction normal to the direction of the incident beam; a second stage for selectively moving the photodetector in a direction normal to the reflected beam; a sensor connected to the photodetector for detecting the displacement of the reflected beam relative to the photodetector.
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申请公布号 |
US5227641(A) |
申请公布日期 |
1993.07.13 |
申请号 |
US19910793458 |
申请日期 |
1991.11.18 |
申请人 |
FRONTIER SEMICONDUCTOR MEASUREMENTS, INC. |
发明人 |
CHENG, DAVID |
分类号 |
G01B11/16;G01B11/255;G01B11/30;H01L21/00 |
主分类号 |
G01B11/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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