发明名称 System for measuring the curvature of a semiconductor wafer
摘要 A system for measuring the curvature of a surface includes a laser for emitting a beam of light to be incident upon the surface; a photodetector for detecting light reflected by the surface; a first stage for selectively moving the surface in a direction normal to the direction of the incident beam; a second stage for selectively moving the photodetector in a direction normal to the reflected beam; a sensor connected to the photodetector for detecting the displacement of the reflected beam relative to the photodetector.
申请公布号 US5227641(A) 申请公布日期 1993.07.13
申请号 US19910793458 申请日期 1991.11.18
申请人 FRONTIER SEMICONDUCTOR MEASUREMENTS, INC. 发明人 CHENG, DAVID
分类号 G01B11/16;G01B11/255;G01B11/30;H01L21/00 主分类号 G01B11/16
代理机构 代理人
主权项
地址