发明名称 REMOVING METHOD AND REMOVING DEVICE FOR RESIST
摘要 PURPOSE:To efficiently execute a removing action in a short period of time and to improve the cleanability of the surface from which a resist is removed by mixing a resist removing liquid and gas or alternately injecting liquid and the gas to the resist. CONSTITUTION:After a base material 2 stuck with the resist to be removed is fixed to a fixing base 3, the removing liquid 1a is introduced into a removing tank 1 at least until the base material 2 is immersed therein. A 1st valve 8 is opened and a pump 7 is operated by a control section 14 to pressurize and circulate the removing liquid through a pipeline 8a from a liquid intake port 5. A 2nd valve 9 is also opened by the control section 14 to introduce the gas through a pipeline 9a from a gas cylinder 10 into the removing tank 1. The removing liquid and the gas are mixed around a coupling part 12 of the pipelines in such a manner and a gas-liquid mixture is injected from an injection nozzle 4 to the resist. Accordingly, the removing liquid is less consumed and the resist is prevented from swelling and dissolving. The development defect and peeling defect in the fine parts of the patterns are thus prevented.
申请公布号 JPH05173336(A) 申请公布日期 1993.07.13
申请号 JP19910314561 申请日期 1991.11.28
申请人 CANON INC 发明人 IMAMURA ISAO
分类号 B41J2/16;G03F7/30;G03F7/36;G03F7/42;H01L21/027;H01L21/30;H01L21/304 主分类号 B41J2/16
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