发明名称 |
Method of diffusing P type impurity |
摘要 |
A method of diffusing a P type impurity into a semiconductor substrate includes selectively implanting ions of a first P type impurity into a semiconductor substrate and thermally diffusing a second P type impurity into the semiconductor substrate at least in a region where the first P type impurity ions are implanted. The diffusion speed of the P type impurity is increased in the ion implantation region whereby a P type impurity diffusion region which nearly corresponds in extent to the ion implantation region is obtained. The P type diffusion region can be precisely produced with a high dopant impurity concentration.
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申请公布号 |
US5225370(A) |
申请公布日期 |
1993.07.06 |
申请号 |
US19910769373 |
申请日期 |
1991.10.01 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TAKAHASHI, SHOGO |
分类号 |
H01L21/22;H01L21/225;H01S5/00 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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