| 摘要 |
PURPOSE:To correctly perform positioning of a mask for forming an element regardless of dispersion of a stock removal by one reference pattern. CONSTITUTION:At the time of forming a separation groove, simultaneously a groove for a reference pattern is formed by using a mask having a cross- shaped opening, later grinding is performed after forming an oxide film and polycrystalline silicon so as to expose a cross-shaped reference pattern 18 consisting of polycrystalline silicon surrounded by an oxide film on the substrate polishing surface. Since a tip of the cross-shaped pattern 18 is always on the center lines 1x, 1y regardless of grinding dispersion, a cross pattern 19 of a mask for forming an element is matched with the tip so as to perform correct mask matching. |
