| 摘要 |
<p>PURPOSE:To efficiently obtain the color filter having a high resolution by subjecting an N type optical semiconductor layer having an optical memory property to optical plotting and electrodeposition. CONSTITUTION:An electrodeposition substrate 2 is constituted of a conductive substrate 3 and the N type optical semiconductor layer 4. Patterns 6R corresponding to the 1st color of the multicolor filters are optically plotted and exposed onto the N type optical semiconductor layer 4. Only the patterns 6R are sensitized and an electrical conductivity is developed to form photosensitive parts 4'R. The substrate is then immersed into an electrodeposition bath corresponding to this color to partially form monochromatic filter layers RD. An insulating state is maintained in the unexposed parts of the N type optical semiconductor layer 4. The color components are removed by washing with water after the electrodeposition. The patterns corresponding to the 2nd and subsequent colors of the multicolor filters are similarly controlled in position to the regions where the filter layers RD are not formed after washing and drying. The formation of the monochromatic filters by optical plotting and exposing is repeated.</p> |
