HALBLEITERSTRUKTUREN.

摘要

The semiconductor structure comprises a single crystal support (12) of low defect density, with selected areas of the crystal having dislocation defects in it. At least one semiconductor layer includes at least one active well and one barrier, epitaxially deposited on the support. The dislocation defects in the support has propagated into contiguous areas of the layer during the epitaxial deposition, where the contiguous areas have a higher dislocation density compared with remaining regions of layer. A disordered alloy is produced in the contiguous areas upon annealing of the structure, the effective rate of disordered conversion in the contiguous areas having been greater than that of the remaining areas because of the dislocation of defects. The disordered alloy regions exhibits higher band gap and higher refracture index properties compared with the remaining areas.