| 摘要 |
PURPOSE:To selectively correct the defect only on a part having a phase difference defect, to unnecessitate a removal process of a shifter layer, to prevent from generation of a new raggedness, to endure a washing process, to prevent from further generation of the defect, to reduce an error detection in a foreign matter inspection on the surface of a photomask and to deal with each defect even in the case when the plural phase difference defects are present on and the phase differences are individually different. CONSTITUTION:In a defect correcting method which corrects the defect of the phase shift part 11 of a phase shift ask providing a phase shift part 11 to shift a phase of exposure light on a translucent substrate 1, a refractive index of the part is changed by introducing an impurity into defective parts 4,5 of the phase shift part 11 by ion beams, etc., thus the phase shift quantity of the defective part is controlled and the correction is carried out. |
