发明名称 |
Ion beam processing system and ion beam processing method |
摘要 |
An ion beam processing system emitting an ion beam at a workpiece to process the workpiece, provided with an electrode for applying an electric field to the workpiece, the potential of the electrode being made 0V or a negative potential, and a cover insulated from the electrode arranged at an ion beam incidence side of the electrode, thereby preventing or suppressing sputtered particles from redepositing on a master pattern and the processed surface to form burrs, and an ion beam processing method used with the same.
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申请公布号 |
US7288173(B2) |
申请公布日期 |
2007.10.30 |
申请号 |
US20040928832 |
申请日期 |
2004.08.27 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
FUKUSHIMA AKIO;YAGAMI KOJIRO |
分类号 |
C23C14/34;G21K5/04;C23F1/00;G11B5/31;H01J37/30;H01J37/305;H01L21/302;H05H1/24 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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