| 摘要 |
<p>PURPOSE:To improve the production yield of the photomask for phase shift and to shorten the time for producing the photomask for phase shift. CONSTITUTION:A transparent film 4 to constitute a phase shifter material is deposited over the entire surface of the 1st photomask P1 to be formed with phase shifters and thereafter, phase shift patterns 3 consisting of a light shielding film formed on the 2nd photomask P2 are transferred onto the 1st photomask P1 by using a light exposing technique and the phase shifters are formed on the 1st photomask P1 by processing the transparent film 4.</p> |
