发明名称 |
DEPOSITION APPARATUS AND METHODS |
摘要 |
2124215 9311276 PCTABS00022 A reactor (10) defines a chamber (11) in which are disposed an upper electrode (12) and a lower workpiece electrode (13). The upper electrode is connected to a R.F. supply whilst the lower electrode is connected to a stress control unit (14). The stress control unit is used to adjust or maintain the effective resistance of the connection between the workpiece electrode (13) and ground.
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申请公布号 |
CA2124215(A1) |
申请公布日期 |
1993.06.10 |
申请号 |
CA19922124215 |
申请日期 |
1992.12.02 |
申请人 |
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发明人 |
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分类号 |
C23C16/50;C23C16/505;C23C16/509;C23C16/52;H01J37/32;(IPC1-7):C23C16/52;C23C14/54 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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