发明名称 DEPOSITION APPARATUS AND METHODS
摘要 2124215 9311276 PCTABS00022 A reactor (10) defines a chamber (11) in which are disposed an upper electrode (12) and a lower workpiece electrode (13). The upper electrode is connected to a R.F. supply whilst the lower electrode is connected to a stress control unit (14). The stress control unit is used to adjust or maintain the effective resistance of the connection between the workpiece electrode (13) and ground.
申请公布号 CA2124215(A1) 申请公布日期 1993.06.10
申请号 CA19922124215 申请日期 1992.12.02
申请人 发明人
分类号 C23C16/50;C23C16/505;C23C16/509;C23C16/52;H01J37/32;(IPC1-7):C23C16/52;C23C14/54 主分类号 C23C16/50
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