发明名称 OPTICAL ANALYSIS SYSTEM AND POSITIONING APPARATUS THEREFOR
摘要 <p>An optical analysis or processing system for use, for example, in the analysis of microscopic spots of material by their effect on a very fine polarized beam of light (e.g. FPIA). For multiple 'spot' analysis the spot samples are disposed on a substrate in predetermined relation with an optical pattern, bars, chevrons, etc. The substrate (1) is mounted in the path of the fixed and focused beam with three degrees of freedom of movement. A video camera (9) records the optical pattern very accurately and controls the substrate mounting to position a selected sample spot at the beam focus. Multiple and rapid sample analysis can thus be performed.</p>
申请公布号 WO1993011469(A1) 申请公布日期 1993.06.10
申请号 GB1992002239 申请日期 1992.12.02
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