| 摘要 |
PURPOSE:To provide a quartz glass substrate for a photomask excellent in etching resistance. CONSTITUTION:This quartz glass substrate for a photomask contains <=10ppm halogen, <=100ppm OH and <=1ppm, in total, of heavy metals and alkali and has >=1,150 deg.C annealing point. Ions of at least one among N, C and Al have been implanted into the surface of this substrate. |
