发明名称 Apparatus and method for patterning a film
摘要 The present invention relates to an apparatus and method for patterning areas of a radiation absorbent film material. In the preferred embodiment, the film material is at least partially electrically conductive. The radiation is focused onto the film by a lenticular lens having a plurality of optically active elements to provide a radiation pattern on the film and remove or displace portions of the film to form a corresponding pattern, preferably a conductive pattern. The film may have one or more layers or regions, but at least one region must be radiation absorbent in order to allow the formation of patterns in the film in accordance with the present invention. The areas of the film affected by the phenomenon of radiation absorption are non-conductive voids which may separate the film into a plurality of conductive grid lines whereby the film is useful with a conductive lens film to increase the apparent efficiency of a photovoltaic cell.
申请公布号 US5216543(A) 申请公布日期 1993.06.01
申请号 US19870021458 申请日期 1987.03.04
申请人 MINNESOTA MINING AND MANUFACTURING COMPANY 发明人 CALHOUN, CLYDE D.
分类号 B23K26/00;B23K26/067;G02B3/00;H01L31/0232 主分类号 B23K26/00
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