| 摘要 |
<p>A superhigh purity gas supply pipe system adapted to prevent a semiconductor device of high cleanliness, into which a gas is introduced through a gas supply pipe system, from being contaminated with the metals or the like deposited during the welding thereof, and a method of installing such a gas supply pipe system. The superhigh purity gas supply pipe system according to the present invention is a pipe system consisting of gas supply pipe system parts having welded portions, characterized in that the gas supply pipe system parts having such welded portions are washed with superhigh purity water before, during or after the installation of the pipe system. The invention also provides a method of installing a superhigh purity gas supply pipe system having welded portions, characterized in that pipe system members are welded as an inert gas or a back seal gas is being introduced into at least these members, superhigh purity water being introduced into the welded members after the welding of these members so as to wash out the metal fume deposited on the inner surfaces of the welded members during the welding thereof.</p> |
