| 摘要 |
PCT No. PCT/GB89/00600 Sec. 371 Date Dec. 3, 1990 Sec. 102(e) Date Dec. 3, 1990 PCT Filed May 31, 1989 PCT Pub. No. WO89/11905 PCT Pub. Date Dec. 14, 1989.This invention relates to gas treatment apparatus and methods and particularly, but not exclusively, to such apparatus and methods for use with exhaust products from semi-conductor manufacturing process. A reactor column 10 has an inlet 11 at the bottom and an outlet 12. Between the inlet and outlet it is divided into three sequential stages containing: silicon or silicon containing materials; lime or soda lime and copper oxide or copper oxide reagents.
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