发明名称 ELECTROPLATING MEANS FOR PERFORATED PRINTED CIRCUIT BOARDS TO BE TREATED IN A HORIZONTAL PASS
摘要 An electroplating apparatus having a plurality of upper electrolyte feeder elements and upper electrolyte discharge elements aligned transversely relative to a throughput path of the printed circuit boards and arranged in alternation above the throughput path, a plurality of lower electrolyte feeder elements and lower electrolyte discharge elements aligned transversely relative to the throughput path and arranged in alternation under the throughput path, wherein each lower electrolyte discharge element is positioned opposite an upper electrolyte feeder element and each upper electrolyte discharge elements is positioned opposite a lower electrolyte feeder element, and wherein vertical and horizontal flow components of the electrolyte solution result and their direction alternatingly changes as seen along the throughput path of the printed circuit boards.
申请公布号 US5211826(A) 申请公布日期 1993.05.18
申请号 US19920941173 申请日期 1992.09.04
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 HOSTEN, DANIEL;VAN PUYMBROECK, JOSEF
分类号 C25D7/00;C25D17/00;C25D17/10;C25D17/12;H05K3/00;H05K3/18;H05K3/42 主分类号 C25D7/00
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