发明名称 Conductive pattern layer structure and method of producing the conductive pattern layer structure.
摘要 The conductive pattern layer structure includes an insulating member (21) containing polyimide, a patterned thin film formed on the insulating member, and a patterned conductive layer (25) formed on the thin film. The patterned conductive layer contains copper. Further, the layer structure includes a patterned barrier layer (26) covering an upper surface and side surfaces of the patterned conductive layer to prevent copper from being diffused into another insulating layer formed around the patterned barrier layer. <IMAGE>
申请公布号 EP0541436(A2) 申请公布日期 1993.05.12
申请号 EP19920402978 申请日期 1992.11.04
申请人 FUJITSU LIMITED 发明人 SATOH, KAZUAKI;IIDA, KENJ
分类号 H05K1/09;H01L21/48;H01L23/498;H05K3/06;H05K3/10;H05K3/24;H05K3/38 主分类号 H05K1/09
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