发明名称 Photosensitive resin and resin composition for lithographic printing.
摘要 <p>Disclosed is a photosensitive diazo resin for lithographic printing represented by the formula: &lt;CHEM&gt; Äwherein X DIVIDED is a counter anion, Y is a divalent bonding group selected from the group consisting of -NH-, -S- and -O-, R&lt;5&gt;, R&lt;6&gt; and R&lt;7&gt; are groups which are independently selected from the group consisting of hydrogen, an alkyl group and an alkoxy group, R&lt;8&gt; and R psi are groups which are independently selected from the group consisting of hydrogen, an alkyl group and a phenyl group, l and m are integers which satisfy the relation: l + m = 2 to 100, l/m = 30 to 99/l to 70 and A is a quaternary ammonium salt-containing group represented by the formula: &lt;CHEM&gt; (wherein B is a straight or branched divalent C&lt;5&gt; PI &lt;5&gt;&lt;4&gt; alkyl group which bonds to an aromatic ring by a group selected from the group consisting of -CH&lt;6&gt;-,-CO-, -O-, -S- and -N-, and R1/4 , R1/2 and R3/4 are groups which are independently selected from the group consisting of hydrogen and a C&lt;5&gt; PI &lt;6&gt;&lt;4&gt; alkyl group provided that at least two of R1/4 , R1/2 and R3/4 are alkyl groups)Ü. A photosensitive resin composition for lithographic printing comprising a diazo resin is also disclosed.</p>
申请公布号 EP0540016(A1) 申请公布日期 1993.05.05
申请号 EP19920118601 申请日期 1992.10.30
申请人 NIPPON PAINT CO., LTD. 发明人 KANDA, KAZUNORI;LAM, EDVARD;NANBA, OSAMU
分类号 G03F7/00;G03F7/004;G03F7/016;G03F7/021;G03F7/032 主分类号 G03F7/00
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