摘要 |
<p>Disclosed is a photosensitive diazo resin for lithographic printing represented by the formula: <CHEM> Äwherein X DIVIDED is a counter anion, Y is a divalent bonding group selected from the group consisting of -NH-, -S- and -O-, R<5>, R<6> and R<7> are groups which are independently selected from the group consisting of hydrogen, an alkyl group and an alkoxy group, R<8> and R psi are groups which are independently selected from the group consisting of hydrogen, an alkyl group and a phenyl group, l and m are integers which satisfy the relation: l + m = 2 to 100, l/m = 30 to 99/l to 70 and A is a quaternary ammonium salt-containing group represented by the formula: <CHEM> (wherein B is a straight or branched divalent C<5> PI <5><4> alkyl group which bonds to an aromatic ring by a group selected from the group consisting of -CH<6>-,-CO-, -O-, -S- and -N-, and R1/4 , R1/2 and R3/4 are groups which are independently selected from the group consisting of hydrogen and a C<5> PI <6><4> alkyl group provided that at least two of R1/4 , R1/2 and R3/4 are alkyl groups)Ü. A photosensitive resin composition for lithographic printing comprising a diazo resin is also disclosed.</p> |