| 摘要 |
PURPOSE:To make just one time of application and exposure of a photosensitive resin sufficient at the time of forming plural patterns on the same substrate by having parts where light transmittance varies in at least three stages. CONSTITUTION:The negative type photosensitive coating film is formed on a copper substrate and after the dried substrate is exposed via a gradation mask, the substrate is subjected to 1st time of development to expose the conductive layer of the parts corresponding to the pattern parts 2 of 0% light transmittance of the gradation mask. The substrate is subjected to electrodeposition coating in an electrodeposition bath contg. a colored coating material of a 1st color and is then washed. The substrate is subjected to 2nd time of development to expose the conductive layer of the parts 3 corresponding to the pattern parts of 5% light transmittance of the gradation mask and is subjected to electrodeposition coating of a 2nd color. The substrate is further subjected to 3rd time of development to expose the conductive layer of the parts corresponding to the pattern parts 4 of 25% light transmittance and is subjected to electrodeposition coating of a 3rd color. Further, substrate is subjected to 4th time of development to expose the conductive layer of the parts 1 corresponding to the patterns of 100% light transmittance and is subjected to electrodeposition coating of a 4th color. The respective colored layers are thus transferred onto the transparent substrate for transfer. |
