POSITIVE PHOTORESIST COMPOSITION,申请号JP19910249329-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	POSITIVE PHOTORESIST COMPOSITION
摘要
申请公布号	JPH0588363(A)	申请公布日期	1993.04.09
申请号	JP19910249329	申请日期	1991.09.27
申请人	TORAY IND INC	发明人	OOSETO HIROKI;KATAOKA MUTSUO
分类号	G03F7/022;H01L21/027	主分类号	G03F7/022
代理机构		代理人
主权项
地址

您可能感兴趣的专利

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

Pipe cleaning apparatus

Method and System for Deploying Content to Wireless Devices

USE OF THERMOPLASTIC POLYURETHANES IN RUBBER MODIFIED BITUMEN ROOFING MEMBRANES

NANOCRYSTALLINECELLULOSE (NCC) IN TAPE JOINT COMPOUND (JC)

REMOVAL OF 1,4-DIOXANE FROM WATER USING CARBONACEOUS ADSORBENTS

Methods and Systems for Network Connectivity

Living Hinge Creation Through Vacuum Forming of a Thermoformable Plastic Sheet

HEAT SEALABLE COATED NYLON

Human Locomotion Assisting Shoe

METHOD AND APPARATUS FOR WEBSITE SCANNING

DYNAMIC SLC/MLC BLOCKS ALLOCATIONS FOR NON-VOLATILE MEMORY

Method for preparing substituted isoxazoline compounds and their precursors 4-chloro, 4-bromo- or 4-iodobenzaldehyde oximes

ERROR DETECTION OR CORRECTION OF STORED SIGNALS AFTER ONE OR MORE HEAT EVENTS IN ONE OR MORE MEMORY DEVICES

APIs TO TEST A DEVICE

Failover Processing

Full-Duplex Bi-Directional Communication Over a Remote Procedure Call Based Communications Protocol, and Applications Thereof

PROVISIONING AND MANAGING A CLUSTER DEPLOYED ON A CLOUD