发明名称 INFRARED SPECTROSCOPE MEASURING DEVICE FCR SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To speedily heat a semiconductor substrate in the infrared ray spectroscope measurement. CONSTITUTION:A heating body 26 made of carbon is installed on a ceramic plate 25 installed in a sample chamber. A wafer W as measured article is closely attached onto the heating body 26 made of carbon by the pressing force of a flat washer 40 due to the tightening of a bolt 38. Each opened port 27 for allowing the passing of the infrared ray radiated on the wafer W is formed at the center parts of the heating body 26 made of carbon and the ceramic plate 25, and the transmission light of the wafer W is detected and spectroscope measured.
申请公布号 JPH0572124(A) 申请公布日期 1993.03.23
申请号 JP19910263230 申请日期 1991.09.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NISHIHARA HIDEO;NISHII KIYOBUMI
分类号 G01N21/00;G01N21/35;H01L21/66 主分类号 G01N21/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利