| 摘要 |
<p>PURPOSE:To obtain the title resin which can give a resin composition which is alkali-soluble, and excellent in heat resistance and adhesion to substrate and j in optical properties such as high transparency and high refractive index by giving thereto a structure represented by a specified formula. CONSTITUTION:An alkali-soluble photopolymer having a structure of formula I [wherein X is-CO-Y-COOH (wherein Y is a residue of an acid anhydride) or H, the proportion of-CO-Y-COOH is 30mol% or above; and Ar is an aromatic residue of formula II (wherein R1 to R4 are each H or lower alkyl); R' is H or CH; and n is 1-20]. The photopolymer of formula I is alkali-soluble and excels in heat resistance and adhesion to substrate. A resin composition containing this photopolymer is an alkali-developable photopolymer composition having excellent photosensitivity and good film properties (heat resistance, adhesion, chemical resistance, surface hardness, etc.), has excellent optical properties such as high transparency and high refractive index), and can be desirably used for a solder resist of a printed wiring board, a protective film of a color liquid crystal filter, or the like.</p> |
