| 摘要 |
The equipment consists of a high-voltage AC source and an etching chamber. The etching chamber consists of a flat tub (1), with a channel on its top (6) for the heating and cooling medium. On the tub (1) there is a seal (2), a metal plate (3) for mounting the detectors connected to the zero voltage potential (7) for specifying the etched area of the detectors and a pressure plate (5) equipped with holes (8) for filling with the etching solution. In each hole (7) of the mask (4) there is a high-voltage electrode needle (12).<IMAGE>
|
