| 摘要 |
<p>PURPOSE:To acquire large electrostatic force even at a low voltage and to reduce a time required for attaching and removing of an attraction object by forming an electrode for attraction by plating a substrate with nonmagnetic and amorphous nickel alloy and by forming an insulator layer on the electrode for attraction. CONSTITUTION:A titanium layer 2 is formed by sputtering on a ceramic substrate 1 whose surface is flattened by grinding and a copper layer 3 is deposited by sputtering on the titanium layer 2. Then, a surface of the copper layer 3 is plated with NiP which is a nonmagnetic and amorphous nickel alloy and a surface thereof is ground to form an electrode layer 4. Then, Ta2O5 is sputtered all over a surface of the ceramic substrate 1 to form an insulator layer 5. Thereby, it is possible to ground irregularities of a surface of an electrode for attraction about 0.01mum or less, to acquire enough breakdown strength even in a thin insulating layer and to acquire large attraction force even at a low voltage.</p> |
