| 摘要 |
<p>A process for preparing a substrate for a lithographic plate, which comprises the steps of subjecting at least one surface of an aluminum plate to a surface roughening treatment, anodizing the resulting plate to form at least 2 g/m<2> of an anodized layer, sealing the anodized plate with hot water or water vapor to reduce the surface area of the anodized layer by from 40 to 95 % and subjecting the sealed plate to at least one of a hydrophilizing treatment or a hydrophilic-undercoating treatment. A lithographic plate which comprises the substrate prepared by the process of the present invention has excellent strength of non-image areas, corrosion resistance of non-image areas, reproduction of highlight areas, printing durability, little dye staining of non-image areas and non-image areas having high hydrophilicity. Further, the lithographic plate produces prints having little background contamination.</p> |
