发明名称 |
Cyclic voltammetric method for the measurement of concentrations of subcomponents of plating solution additive mixtures |
摘要 |
A cyclic voltammetric method for measuring concentrations of subcomponents of additive mixtures, comprising the steps of: (a) preparing a basis solution which contains all of the components of an unknown solution to be measured, except a component of interest; (b) preparing a calibration solution which contains the component of interest in a known concentration near that which would be expected in the unknown solution; (c) adding measured amounts of the calibration solution to a first defined volume of the basis solution and plotting a first cathodic charge against the added volume of the calibration standard; (d) adding measured amounts of the unknown solution to a second volume of the basis solution and plotting a second cathodic charge against the added volume of the unknown solution; and (e) comparing the slopes of the first and second curves to determine the concentration of the component of interest in the unknown solution.
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申请公布号 |
US5192403(A) |
申请公布日期 |
1993.03.09 |
申请号 |
US19910701278 |
申请日期 |
1991.05.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHANG, I-CHIA H.;HORKANS, WILMA J. |
分类号 |
C25D3/38;C25D21/12;C25D21/14;G01N27/416;G01N27/42;G01N27/48 |
主分类号 |
C25D3/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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