发明名称 Contact exposure unit for photosensitive material, e.g. offset or flexoprinting plates, PCB(s) or foils - has rest and pressure system for photosensitive coated material in contact with original and light source radiating UV light exposing material through original
摘要 A unit removes the IR component of the light radiated from the light source before it impinges on the photosensitive coated material. The unit has one or more filter plates (15) arranged one behind the other. A surface mirror (17) is arranged in the beam path of the light source (13) and is provided with a coating reflecting UV light but transparent for IR light. The light source has a reflector (14) coated to reflect UV light but transmissive for IR light. ADVANTAGE - Type of unit improved so that, esp. in continuous operation, inaccuracies concerning contour focus and uniform exposure are cleared as completely as possible.
申请公布号 DE4128439(A1) 申请公布日期 1993.03.04
申请号 DE19914128439 申请日期 1991.08.27
申请人 HUF, HANS-JOACHIM, DR., 6500 MAINZ, DE 发明人 HUF, HANS-JOACHIM, DR., 6500 MAINZ, DE
分类号 G03B27/16;H05K3/00 主分类号 G03B27/16
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