Novolak resin compositions with high Tg and high sensitivity for photoresist applications.

摘要

A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is obtained by condensing with formaldehyde a mixture of from about 30 to about 98 mol percent of meta-cresol, from about 1 to about 40 mol percent of 3,5-dimethylphenol and from about 1 to about 10 mol percent of a substituted or unsubstituted multihydroxy phenol.