发明名称 LASER SHAPING AN AREA PATTERNING MASK
摘要 <p>Sculpturing by ablation is controlled on an area basis by a mask pattern which determines transmission, e.g. of a laser beam, in accordance with the desired degree of ablation as a function of position. In one embodiment, a set of binarally weighted masks (A-H) is employed to produce a required change in the configuration of the surface of the workpiece being sculptured. This is illustrated by Fig. 3, showing at the left hand side the relative amounts of material to be removed in four adjacent pixels, and to the right of this a set of four pattern masks by the successive use of which these amounts can be ablated in total for each pixel.</p>
申请公布号 KR930001313(B1) 申请公布日期 1993.02.25
申请号 KR19900013812 申请日期 1990.09.03
申请人 GENRAL ELECTRIC CO. 发明人 LEVINSON, RONNEN M.;ROSE, JAMES W.;LIU, YUNG S.
分类号 G03F1/08;A61F9/00;A61F9/007;A61F9/008;A61F9/01;B23K26/06;G03F7/20;H01S3/00;(IPC1-7):A61N5/10 主分类号 G03F1/08
代理机构 代理人
主权项
地址