发明名称 |
WAFER STORAGE |
摘要 |
<p>PURPOSE:To provide a wafer storage box capable of protecting wafers from oxidation definitely. CONSTITUTION:To remove the oxygen and moisture in the air which are considered attributable to the oxidation of wafers from a wafer storage box 12, nitrogen gas (inactive gas) is supplied into the wafer storage box 12 from a nitrogen gas cylinder 16 so that the air in the wafer storage box 12 may by replaced with the nitrogen gas. This construction makes it possible to protect the stored wafers from oxidation since the wafer storage box 12 is in a nitrogen gas atmosphere.</p> |
申请公布号 |
JPH0541446(A) |
申请公布日期 |
1993.02.19 |
申请号 |
JP19910221113 |
申请日期 |
1991.08.06 |
申请人 |
HITACHI PLANT ENG & CONSTR CO LTD |
发明人 |
HIRATA JUNTA;SUGIURA TAKUMI |
分类号 |
H01L21/02;H01L21/673;H01L21/68 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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